Title :
Double diffraction at a pair of coplanar skew wedges
Author :
Albani, M. ; Capolino, F. ; Maci, S. ; Tiberio, R.
Author_Institution :
Dept. of Inf. Eng., Siena Univ., Italy
Abstract :
The present work is a generalization of that dealing with a pair of knife-edges. In particular, a high-frequency solution is obtained for the scattering in the near zone of a pair of coplanar skew wedges with arbitrary exterior angle, illuminated by a source at finite distance. The solution is achieved by using a spherical wave spectral representation of the incident, singly diffracted field by the first wedge. The electromagnetic solution is constructed from the relevant scalar formulation by choosing appropriate ray-fixed reference systems. The final dyadic closed form expression is cast in the uniform theory of diffraction (UTD) framework, and includes terms up to the second order. These latter become of the same order as the leading terms in overlapping transition regions of the two wedges. This solution is also directly applicable when the two wedges share a common face for both polarizations; in this case, the second order terms provide an accurate description of those contributions that are usually neglected for soft polarization.
Keywords :
electromagnetic wave diffraction; electromagnetic wave polarisation; electromagnetic wave scattering; geometrical theory of diffraction; UTD; arbitrary exterior angle; coplanar skew wedges; double diffraction; dyadic closed form expression; electromagnetic diffraction; electromagnetic scattering; high-frequency solution; incident singly diffracted field; overlapping transition regions; polarization; ray-fixed reference systems; scalar formulation; spherical wave spectral representation; uniform theory of diffraction; Boundary conditions; Brain modeling; Electromagnetic coupling; Electromagnetic diffraction; Electromagnetic fields; Electromagnetic propagation; Electromagnetic scattering; Geometry; Physical theory of diffraction; Polarization;
Conference_Titel :
Antennas and Propagation Society International Symposium, 1999. IEEE
Conference_Location :
Orlando, FL, USA
Print_ISBN :
0-7803-5639-x
DOI :
10.1109/APS.1999.789265