Decel lens system for low-energy ion implantation with high dose uniformity

Author

Teichert, Jochen ; von Borany, Johannes

Author_Institution

Inst. fur Ionenstrahlphys. und Materialforschung, Forschungszentrum Rossendorf e.V., Dresden, Germany

fYear

2000

fDate

2000

Firstpage

388

Lastpage

391

Abstract

In this paper we report on the design of a decel lens system for low energy ion implantation. The novel lens system consisting of a converging and a diverging lens in a compact arrangement allows one to compensate the spherical aberration. Therefore implantation into large areas at low energies can be performed with high dose uniformity. The implantation chamber with the decel lens system is fitted to the beamline 2 of the medium energy implanter DANFYSIK 1090 at the Forschungszentrum Rossendorf. Using a beam energy of 30 keV the ions can be decelerated up to 2 keV with a dose uniformity of <5% for 100 mm diameter

Keywords

aberrations; beam handling equipment; ion implantation; ion optics; lenses; particle beam focusing; 100 mm; 30 keV; Forschungszentrum Rossendorf; beamline 2; compact arrangement; converging lens; decel lens system; design; diverging lens; dose uniformity; high dose uniformity; low-energy ion implantation; medium energy implanter DANFYSIK 1090; spherical aberration; Current density; Electrostatics; Ion beams; Ion implantation; Lenses; Microelectronics; Optical design; Particle beam optics; Silicon; Vacuum systems;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology, 2000. Conference on

Conference_Location

Alpbach

Print_ISBN

0-7803-6462-7

Type

conf

DOI

10.1109/.2000.924169

Filename

924169