Title :
Improved cooling on the Varian E220/E500 series implanters
Author :
Rhoads, Kevin ; Larsen, Kenji ; Evans, Morgan
Author_Institution :
Varian Semicond. Equip. Assoc. Inc., Gloucester, MA, USA
Abstract :
Single wafer ion implanter manufacturers have traditionally relied on gas-cooled mechanical clamps for higher beam power applications and non gas-cooled electrostatic clamps (ESC) for lower power applications. Varian has recently developed a mid-power, non-gas-cooled ESC. This improvement allows for higher wafer throughput than a traditional ESC without the complexity of gas cooling
Keywords :
cooling; electrostatic devices; ion implantation; semiconductor doping; Varian E220/E500 series implanters; cooling; higher beam power applications; lower power applications; mid-power nongas-cooled electrostatic clamps; single wafer ion implanter manufacturers; wafer throughput; Clamps; Cooling; Current measurement; Electrostatics; Fluid flow measurement; Heat transfer; Implants; Semiconductor device manufacture; Temperature measurement; Throughput;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924186
