DocumentCode
3114319
Title
Improved cooling on the Varian E220/E500 series implanters
Author
Rhoads, Kevin ; Larsen, Kenji ; Evans, Morgan
Author_Institution
Varian Semicond. Equip. Assoc. Inc., Gloucester, MA, USA
fYear
2000
fDate
2000
Firstpage
456
Lastpage
459
Abstract
Single wafer ion implanter manufacturers have traditionally relied on gas-cooled mechanical clamps for higher beam power applications and non gas-cooled electrostatic clamps (ESC) for lower power applications. Varian has recently developed a mid-power, non-gas-cooled ESC. This improvement allows for higher wafer throughput than a traditional ESC without the complexity of gas cooling
Keywords
cooling; electrostatic devices; ion implantation; semiconductor doping; Varian E220/E500 series implanters; cooling; higher beam power applications; lower power applications; mid-power nongas-cooled electrostatic clamps; single wafer ion implanter manufacturers; wafer throughput; Clamps; Cooling; Current measurement; Electrostatics; Fluid flow measurement; Heat transfer; Implants; Semiconductor device manufacture; Temperature measurement; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924186
Filename
924186
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