Title :
A new tool for nondestructive monitoring of ion implantation
Author :
Coleman, P.G. ; Burrows, C.P. ; Knights, A.P. ; Gwilliam, R.M. ; Sealy, B.J. ; Goldberg, R.D. ; Al-Bayati, A. ; Foad, M. ; Murrell, A.
Author_Institution :
Dept. of Phys., Bath Univ., UK
Abstract :
We describe recent research designed to assess the potential of charged particle beams as an implant-monitoring tool. The technique currently under development, based on positron annihilation spectroscopy, is totally nondestructive, sensitive to implant doses as low as 109 cm-2, and most importantly, can be tuned to obtain depth-resolved information. A collaborative project between the Surrey Ion Beam Centre and researchers at the University of Bath is underway, aimed at developing a tool suitable for use in the semiconductor industry. A prototype instrument is described, together with preliminary measurements using a laboratory based instrument. Applications to other vacancy-mediated processes, and the value of the new instrument in a research and development environment is discussed
Keywords :
doping profiles; ion implantation; nondestructive testing; positron annihilation; process control; Si:B; Surrey Ion Beam Centre; University of Bath; charged particle beams; depth-resolved information; implant-monitoring tool; ion implantation nondestructive monitoring; positron annihilation spectroscopy; vacancy-mediated processes; Collaborative tools; Electronics industry; Implants; Instruments; Ion beams; Ion implantation; Monitoring; Particle beams; Positrons; Spectroscopy;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924238
