Title :
Monte Carlo simulation of X-ray diffraction embedded in experimental determination of residual stresses in microsystems
Author :
Zschenderlein, U. ; Wunderle, B.
Author_Institution :
Dept. of Mater. & Reliability of Microsyst., Chemnitz Univ. of Technol., Chemnitz, Germany
Abstract :
In this paper a simulation is presented which tracks photons through complex material systems. Besides the usual Compton and Rayleigh scattering that is covered in high energy radiography simulations the presented model considers Bragg-Laue diffraction. The implementation bases on a Monte Carlo code to account for the scattering during radiography. In this paper first results of the simulation are presented. A simple radiation as well as a diffraction experiment was setup. The attenuation coefficient and the position of the diffraction peaks drawn out of the simulation were in good agreement with the literature.
Keywords :
Compton effect; Monte Carlo methods; Rayleigh scattering; X-ray diffraction; internal stresses; micromechanical devices; radiography; Bragg-Laue diffraction; Compton scattering; Monte Carlo code; Monte Carlo simulation; Rayleigh scattering; X-ray diffraction; attenuation coefficient; complex material systems; diffraction experiment; diffraction peaks; experimental determination; high energy radiography simulations; microsystems; residual stresses; Crystals; Lead; Photonics; Scattering; Simulation; X-ray diffraction; X-ray scattering;
Conference_Titel :
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE), 2011 12th International Conference on
Conference_Location :
Linz
Print_ISBN :
978-1-4577-0107-8
DOI :
10.1109/ESIME.2011.5765774