• DocumentCode
    3116160
  • Title

    Monte Carlo simulation of X-ray diffraction embedded in experimental determination of residual stresses in microsystems

  • Author

    Zschenderlein, U. ; Wunderle, B.

  • Author_Institution
    Dept. of Mater. & Reliability of Microsyst., Chemnitz Univ. of Technol., Chemnitz, Germany
  • fYear
    2011
  • fDate
    18-20 April 2011
  • Firstpage
    42376
  • Lastpage
    42558
  • Abstract
    In this paper a simulation is presented which tracks photons through complex material systems. Besides the usual Compton and Rayleigh scattering that is covered in high energy radiography simulations the presented model considers Bragg-Laue diffraction. The implementation bases on a Monte Carlo code to account for the scattering during radiography. In this paper first results of the simulation are presented. A simple radiation as well as a diffraction experiment was setup. The attenuation coefficient and the position of the diffraction peaks drawn out of the simulation were in good agreement with the literature.
  • Keywords
    Compton effect; Monte Carlo methods; Rayleigh scattering; X-ray diffraction; internal stresses; micromechanical devices; radiography; Bragg-Laue diffraction; Compton scattering; Monte Carlo code; Monte Carlo simulation; Rayleigh scattering; X-ray diffraction; attenuation coefficient; complex material systems; diffraction experiment; diffraction peaks; experimental determination; high energy radiography simulations; microsystems; residual stresses; Crystals; Lead; Photonics; Scattering; Simulation; X-ray diffraction; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE), 2011 12th International Conference on
  • Conference_Location
    Linz
  • Print_ISBN
    978-1-4577-0107-8
  • Type

    conf

  • DOI
    10.1109/ESIME.2011.5765774
  • Filename
    5765774