A micromachined thin-film Teflon electret microphone

Author

Hsieh, Wen H. ; Hsu, Tseng-Yang ; Tai, Yu-Chong

Author_Institution

Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA

Volume

1

fYear

1997

fDate

16-19 Jun 1997

Firstpage

425

Abstract

This paper reports the fabrication and characterization of the first micromachined one-micron-thick thin-film Teflon electret condenser microphone. The microphone uses a new MEMS-compatible thin-film Teflon electret technology, first reported at Hilton Head (1996). The millimeter-scale electret microphone has very low stray capacitance, is self-biasing, mass producible, arrayable, integrable with on-chip electronics, structurally simple and extremely stable over time in the ordinary environment. The dynamic range is from 60 to above 110 dB SPL (re. 20 μPa) and the sensitivity is on the order of 0.2 mV/Pa over the frequency range 100 Hz-10 kHz

Keywords

electrets; frequency response; micromachining; microphones; polymer films; sensitivity; 100 Hz to 10 kHz; MEMS-compatible thin-film Teflon electret technology; dynamic range; frequency response; micromachining; millimeter-scale electret microphone; on-chip electronics compatibility; self-biasing; sensitivity; stray capacitance; thin-film Teflon electret microphone; time stability; Adhesives; Biomembranes; Electrets; Electron beams; Fabrication; Microphone arrays; Plasma temperature; Silicon compounds; Transistors; Water storage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.613676

Filename

613676