DocumentCode
3116466
Title
Wavelength trimming of MEMS VCSELs for post-process wavelength allocation
Author
Sano, Hayato ; Nakata, Norihiko ; Matsutani, Akihiro ; Koyama, Fumio
Author_Institution
Microsyst. Res. Center, Tokyo Inst. of Technol., Tokyo, Japan
fYear
2010
fDate
May 31 2010-June 4 2010
Firstpage
1
Lastpage
4
Abstract
We demonstrate the wavelength trimming of MEMS VCSELs by etching the cantilever-shaped top mirror using FIB. This technique can be used for the post-process precise wavelength allocation of athermal MEMS VCSELs. Experimental results show a possibility of realizing both red-shift and blue-shift wavelength changes by choosing the etching area of the cantilever.
Keywords
cantilevers; focused ion beam technology; micro-optics; micromechanical devices; optical fabrication; sputter etching; surface emitting lasers; FIB; MEMS VCSEL; cantilever shaped top mirror etching; post process wavelength allocation; wavelength trimming; Air gaps; Distributed Bragg reflectors; Etching; Micromechanical devices; Mirrors; Semiconductor lasers; Surface emitting lasers; Temperature dependence; Vertical cavity surface emitting lasers; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
Conference_Location
Kagawa
ISSN
1092-8669
Print_ISBN
978-1-4244-5919-3
Type
conf
DOI
10.1109/ICIPRM.2010.5516225
Filename
5516225
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