Title :
The DARPA COSMOS program: The convergence of InP and Silicon CMOS technologies for high-performance mixed-signal
Author :
Raman, Sanjay ; Chang, Tsu-Hsi ; Dohrman, Carl L. ; Roske, Mark J.
Author_Institution :
Defense Adv. Res. Projects Agency, Arlington, VA, USA
fDate :
May 31 2010-June 4 2010
Abstract :
The COmpound Semiconductor Materials On Silicon (COSMOS) program of the U.S. Defense Advanced Research Projects Agency (DARPA) focuses on developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices with high-density silicon circuits. The technical approaches being explored in this program include high-density micro assembly, monolithic epitaxial growth, and epitaxial layer printing processes. In Phase I of the program, performers successfully demonstrated world-record differential amplifiers through heterogeneous integration of InP HBTs with commercially fabricated CMOS circuits. In the current Phase II, complex wideband, large dynamic range, high-speed digital-to-analog convertors (DACs) are under development based on the above heterogeneous integration approaches. These DAC designs will utilize InP HBTs in the critical high-speed, high-voltage swing circuit blocks and will employ sophisticated in situ digital correction techniques enabled by CMOS transistors. This paper will also discuss the Phase III program plan as well as future directions for heterogeneous integration technology that will benefit mixed signal circuit applications.
Keywords :
CMOS integrated circuits; III-V semiconductors; digital-analogue conversion; elemental semiconductors; epitaxial growth; heterojunction bipolar transistors; indium compounds; microassembling; mixed analogue-digital integrated circuits; power integrated circuits; printing; semiconductor epitaxial layers; semiconductor growth; silicon; CMOS circuits; CMOS transistors; DARPA COSMOS program; HBTs; InP; Si; U.S. Defense Advanced Research Projects Agency; complex wideband convertors; compound semiconductor devices; compound semiconductor materials-on-silicon program; critical high-speed blocks; epitaxial layer printing processes; high-density microassembly; high-density silicon circuits; high-performance mixed-signal; high-speed digital-to-analog convertors; high-voltage swing circuit blocks; in situ digital correction techniques; large dynamic range convertors; monolithic epitaxial growth; silicon CMOS technologies; transistor-scale heterogeneous integration processes; world-record differential amplifiers; Assembly; CMOS technology; Circuits; Differential amplifiers; Epitaxial growth; Epitaxial layers; Indium phosphide; Printing; Semiconductor materials; Silicon; ADC; DAC; InP HBT; Si CMOS; compound semiconductor; heterogeneous integration; mixed signal circuit;
Conference_Titel :
Indium Phosphide & Related Materials (IPRM), 2010 International Conference on
Conference_Location :
Kagawa
Print_ISBN :
978-1-4244-5919-3
DOI :
10.1109/ICIPRM.2010.5516241