DocumentCode :
3117191
Title :
Reverse bias capacitance extraction from finite element semiconductor device models [varactors]
Author :
Gibson, A.A.P.
fYear :
2002
fDate :
18-19 Nov. 2002
Firstpage :
277
Lastpage :
283
Abstract :
The purpose of this work is to produce physical finite element models of varactor structures. A silicon p-n device is described here and the finite element calculated potential and charge solutions are used to extract the capacitance parameter in reverse bias. The finite element system used shows great flexibility and allows a wide range of results to be readily extracted, and the structure to be modified and recalculated with little inconvenience. The significance of this work is to underpin the physical finite element modelling of varactor structures. The paper describes the physical device model, the finite element method and presents carrier density plots and illustrates the non-linear varactor operation. A novel analytic method for calculating capacitance is also presented and used to validate the numerical results.
Keywords :
capacitance; carrier density; doping profiles; electronic engineering computing; elemental semiconductors; finite element analysis; semiconductor device models; silicon; varactors; FEM calculated potential/charge; Si; carrier concentration; carrier density; doping profiles; finite element semiconductor device models; nonlinear varactor operation; silicon p-n varactor structures; varactor reverse bias capacitance extraction; Anodes; Capacitance; Cathodes; Charge carrier processes; Electron mobility; Finite element methods; Maxwell equations; Poisson equations; Semiconductor device modeling; Varactors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices for Microwave and Optoelectronic Applications, 2002. EDMO 2002. The 10th IEEE International Symposium on
Print_ISBN :
0-7803-7530-0
Type :
conf
DOI :
10.1109/EDMO.2002.1174971
Filename :
1174971
Link To Document :
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