DocumentCode :
311774
Title :
Electrical properties and phase transformations in antiferroelectric lead zirconate thin films
Author :
Yamakawa, K. ; Trolier-McKinstry, S. ; Dougherty, J.P.
Author_Institution :
Intercoll. Mater. Res. Lab., Pennsylvania State Univ., University Park, PA, USA
Volume :
1
fYear :
1996
fDate :
18-21 Aug 1996
Firstpage :
405
Abstract :
Field-induced phase transformations in antiferroelectric lead zirconate thin films were investigated at various temperatures. Films with (240) preferred orientations were prepared on Pt-coated Si substrates by a reactive magnetron co-sputtering method followed by rapid thermal annealing. Crystallization temperatures between 600 and 700°C resulted in square double hysteresis loops with large values of the maximum polarization (up to 70 μC/cm2). These very large values of induced polarization make such films attractive for energy storage applications. The phase transformations between the orthorhombic antiferroelectric phase and a rhombohedral ferroelectric phase, as well as ferroelectric-ferroelectric transitions were observed by studying the dielectric properties and the polarization-electric field hysteresis as a function of temperature. The behavior of the films is largely similar to that observed in single crystals, although the antiferroelectric-paraelectric phase transition temperature was increased by ~20°C. Work on the strain change accompanying the field-induced transformation will also be reported
Keywords :
antiferroelectric materials; crystallisation; dielectric hysteresis; dielectric polarisation; ferroelectric materials; ferroelectric thin films; ferroelectric transitions; lead compounds; rapid thermal annealing; solid-state phase transformations; sputtered coatings; 600 to 700 C; PbZrO3; antiferroelectric lead zirconate thin films; antiferroelectric-paraelectric phase transition temperature; crystallization temperatures; electrical properties; energy storage applications; ferroelectric-ferroelectric transitions; induced polarization; maximum polarization; orthorhombic antiferroelectric phase; phase transformations; polarization-electric field hysteresis; rapid thermal annealing; reactive magnetron co-sputtering method; rhombohedral ferroelectric phase; Crystallization; Energy storage; Ferroelectric films; Ferroelectric materials; Hysteresis; Polarization; Rapid thermal annealing; Semiconductor films; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 1996. ISAF '96., Proceedings of the Tenth IEEE International Symposium on
Conference_Location :
East Brunswick, NJ
Print_ISBN :
0-7803-3355-1
Type :
conf
DOI :
10.1109/ISAF.1996.602776
Filename :
602776
Link To Document :
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