Enhanced chromatographic performance of silicon-micromachined capillary column with clean structure and interactive plasma organic films

Author

Hannoe, Shinsuke ; Sugimoto, Iwao ; Yanagisawa, Keiichi ; Kuwano, Hiroki

Author_Institution

NTT Integrated Inf. & Energy Syst. Labs., Tokyo, Japan

Volume

1

fYear

1997

fDate

16-19 Jun 1997

Firstpage

515

Abstract

A clean and small dead-space-micro-column was fabricated by silicon isotropic wet etching and ultrasonic machining. The micro-column which was formed on silicon substrate was 100 μm in width, 10 μm in depth, and 2.0 m in length. It has a very smooth surface which was formed by isotropic wet etching using a mixture of hydrofluoric, nitric, and acetic acid. To achieve connection to the detector and injection system, a new ultrasonic machining technique was used. Stationary phase of this micro-column was made from a sputtered fluoropolymer film for enhancing separation. This micro-column demonstrates enhanced chromatographic performance for methane gas analysis

Keywords

capillarity; chromatography; elemental semiconductors; etching; micromachining; micromechanical devices; separation; silicon; ultrasonic machining; 10 micron; 100 micron; 2 m; Si; clean structure; enhanced chromatographic performance; enhanced separation; interactive plasma organic films; isotropic wet etching; methane gas analysis; micromachined capillary column; small dead-space-micro-column; sputtered fluoropolymer film; stationary phase; ultrasonic machining; very smooth surface; Detectors; Fabrication; Joining processes; Machining; Rough surfaces; Semiconductor films; Silicon compounds; Substrates; Surface roughness; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.613700

Filename

613700