Title :
An Improved Parallel Implementation of 3D DRIE Simulation on GPU
Author :
Zhang, Fan ; Wang, Gang ; Liu, Xiaoguang ; Liu, Jing
Author_Institution :
Nankai-Baidu Joint Lab., Nankai Univ., Tianjin, China
Abstract :
Deep reactive ion etching (DRIE) technique is a new and powerful tool in Micro-Electro-Mechanical Systems (MEMS) fabrication. A 3D DRIE simulation can help researcher understand the time-evolution of Bosch process used in DRIE. Due to the high complexity of the algorithm used in the simulation, it is necessary to develop an algorithm that can accelerate the simulation. This paper presents a parallel implementation of the 3D DRIE simulation based on GPU, built on Nvidia´s Compute Unified Device Architecture (CUDA) platform. This paper also presents a fast morphological operation, which reduces the complexity of mathematical morphology operation part of the algorithm from O(N3) to O(N2). The experiment results show the parallel program on Nvidia GTX260+ GPU obtains about 70× to 75× speedup over the 4-threads parallel version on Intel Q6600 CPU.
Keywords :
computer graphics; coprocessors; etching; micromechanical devices; parallel architectures; production engineering computing; 3D DRIE simulation; Intel Q6600 CPU; Nvidia GTX260+ GPU; compute unified device architecture; deep reactive ion etching technique; graphics processing unit; microelectromechanical systems fabrication; Acceleration; Computational modeling; Computer architecture; Concurrent computing; Etching; Fabrication; Microelectromechanical systems; Micromechanical devices; Morphological operations; Morphology;
Conference_Titel :
Pervasive Systems, Algorithms, and Networks (ISPAN), 2009 10th International Symposium on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-4244-5403-7
DOI :
10.1109/I-SPAN.2009.111
