DocumentCode :
3121409
Title :
Phase change and optical band gap behavior of Ge-Zn-Te chalcogenide films
Author :
Wang, Guoxiang ; Nie, Qiuhua ; Shen, Xiang ; Xu, Tiefeng ; Dai, Shixun
Author_Institution :
Shanghai Inst. of Tech. Phys., Shanghai, China
fYear :
2011
fDate :
7-9 Nov. 2011
Firstpage :
1
Lastpage :
4
Abstract :
Glassy alloys with composition of Ge20ZnxTe80-x (x=0, 5, 10, 15at%) were prepared by conventional melt-quenching method, which were subsequently used as target for thermal evaporation (TE) technique under vacuum. The Ge-Te-Zn chalcogenide thin films were characterized with XRD and Transmittance spectra. XRD measurements indicate that there is an amorphous-to-crystalline phase transition. The GeTe crystallines were suppressed in the film with x=5 after annealing while the GeTe crystallines become predominant and the formation of Te crystallines were suppressed with Zn content increasing. Optical band gap is estimated using Tauc´s extrapolation and is found to decrease from 0.509 to 0.395eV in as-deposited films with x=0, 5, 10., while the optical band gap increases to 0.555eV in as-deposited films with x=15. The similar behavior is also observed in the annealed films. A comparison of optical band gap of various films illustrates the thermally-induced effects.
Keywords :
X-ray diffraction; annealing; chalcogenide glasses; crystallisation; energy gap; evaporation; germanium alloys; melt processing; phase change materials; quenching (thermal); semiconductor thin films; vacuum techniques; zinc alloys; Ge20ZnxTe80-x; Tauc extrapolation; XRD measurements; amorphous-to-crystalline phase transition; chalcogenide films; chalcogenide thin films; electron volt energy 0.509 eV to 0.395 eV; melt-quenching method; optical band gap behavior; thermal evaporation technique; thermally-induced effects; transmittance spectra; vacuum technique; Annealing; Optical films; Optical refraction; Optical variables control; Photonic band gap; Zinc; chalcogenide film; optical band gap; phase change;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium (NVMTS), 2011 11th Annual
Conference_Location :
Shanghai
Print_ISBN :
978-1-4577-1428-3
Type :
conf
DOI :
10.1109/NVMTS.2011.6137083
Filename :
6137083
Link To Document :
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