DocumentCode
3121781
Title
Stepwise regression for identifying sources of variation in a semiconductor manufacturing process
Author
McCray, Anthony T. ; McNames, James ; Abercrombie, David
Author_Institution
IC Design & Test Lab., Portland State Univ., OR, USA
fYear
2004
fDate
4-6 May 2004
Firstpage
448
Lastpage
452
Abstract
In any semiconductor manufacturing process identifying tools that are significant sources of variation is critical to developing and maintaining a high yield process. Unfortunately, the most common tool for accomplishing this, analysis of variance (ANOVA), is not well suited for this task. We propose to apply stepwise regression (SWR), a well-known statistical modeling technique, for identifying tools with large contributions to the overall variance. In this paper we explain how SWR can be used to analyze the semiconductor manufacturing process and then discuss simulations which show that in many common situations SWR performs better than ANOVA.
Keywords
covariance analysis; integrated circuit yield; regression analysis; semiconductor device manufacture; semiconductor process modelling; statistical process control; analysis of variance; semiconductor manufacturing process; statistical modeling; stepwise regression; Analysis of variance; Integrated circuit testing; Laboratories; Large scale integration; Logic design; Logic testing; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN
0-7803-8312-5
Type
conf
DOI
10.1109/ASMC.2004.1309613
Filename
1309613
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