• DocumentCode
    3121781
  • Title

    Stepwise regression for identifying sources of variation in a semiconductor manufacturing process

  • Author

    McCray, Anthony T. ; McNames, James ; Abercrombie, David

  • Author_Institution
    IC Design & Test Lab., Portland State Univ., OR, USA
  • fYear
    2004
  • fDate
    4-6 May 2004
  • Firstpage
    448
  • Lastpage
    452
  • Abstract
    In any semiconductor manufacturing process identifying tools that are significant sources of variation is critical to developing and maintaining a high yield process. Unfortunately, the most common tool for accomplishing this, analysis of variance (ANOVA), is not well suited for this task. We propose to apply stepwise regression (SWR), a well-known statistical modeling technique, for identifying tools with large contributions to the overall variance. In this paper we explain how SWR can be used to analyze the semiconductor manufacturing process and then discuss simulations which show that in many common situations SWR performs better than ANOVA.
  • Keywords
    covariance analysis; integrated circuit yield; regression analysis; semiconductor device manufacture; semiconductor process modelling; statistical process control; analysis of variance; semiconductor manufacturing process; statistical modeling; stepwise regression; Analysis of variance; Integrated circuit testing; Laboratories; Large scale integration; Logic design; Logic testing; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
  • Print_ISBN
    0-7803-8312-5
  • Type

    conf

  • DOI
    10.1109/ASMC.2004.1309613
  • Filename
    1309613