DocumentCode :
3121781
Title :
Stepwise regression for identifying sources of variation in a semiconductor manufacturing process
Author :
McCray, Anthony T. ; McNames, James ; Abercrombie, David
Author_Institution :
IC Design & Test Lab., Portland State Univ., OR, USA
fYear :
2004
fDate :
4-6 May 2004
Firstpage :
448
Lastpage :
452
Abstract :
In any semiconductor manufacturing process identifying tools that are significant sources of variation is critical to developing and maintaining a high yield process. Unfortunately, the most common tool for accomplishing this, analysis of variance (ANOVA), is not well suited for this task. We propose to apply stepwise regression (SWR), a well-known statistical modeling technique, for identifying tools with large contributions to the overall variance. In this paper we explain how SWR can be used to analyze the semiconductor manufacturing process and then discuss simulations which show that in many common situations SWR performs better than ANOVA.
Keywords :
covariance analysis; integrated circuit yield; regression analysis; semiconductor device manufacture; semiconductor process modelling; statistical process control; analysis of variance; semiconductor manufacturing process; statistical modeling; stepwise regression; Analysis of variance; Integrated circuit testing; Laboratories; Large scale integration; Logic design; Logic testing; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN :
0-7803-8312-5
Type :
conf
DOI :
10.1109/ASMC.2004.1309613
Filename :
1309613
Link To Document :
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