Nanofabrication based on MEMS

Author

Wang, Yuelin ; Li, Xinxin ; Li, Tie ; Yang, Heng ; Jiao, Jiwei

Author_Institution

Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai, China

fYear

2004

fDate

24-27 Oct. 2004

Firstpage

1044

Abstract

In this paper, a novel nanofabrication method that developed from the traditional MEMS technology with anisotropic etching, deep reaction ion etching and sacrificial layer process has been presented. Nano needles, nano wires, nano beams even nano devices can be fabricated in a batch process. Beams with thickness of 12 nm, a nano tip with a heater on the beam, and a nano wire where width and thickness is only 50 nm are demonstrated. The scale effect of the Young´s modulus of silicon has been observed and the nano-electronic-mechanical data storage has been achieved.

Keywords

Young´s modulus; elemental semiconductors; micromachining; micromechanical devices; nanoelectronics; nanostructured materials; plasma materials processing; silicon; sputter etching; 12 nm; 50 nm; MEMS based nanofabrication; MEMS technology; Si; Young´s modulus scale effect; anisotropic etching; batch process; deep reaction ion etching; nano beams; nano devices; nano needles; nano tip beam heater; nano wires; nano-electronic-mechanical data storage; sacrificial layer process; silicon; Anisotropic magnetoresistance; Dry etching; Infrared sensors; Memory; Micromechanical devices; Nanofabrication; Probes; Silicon; Wet etching; Wire;

fLanguage

English

Publisher

ieee

Conference_Titel

Sensors, 2004. Proceedings of IEEE

Print_ISBN

0-7803-8692-2

Type

conf

DOI

10.1109/ICSENS.2004.1426353

Filename

1426353