Title :
Effects of lithographic roughness and sidewall slope on the optical performance of polymer rectangular waveguides: Modeling
Author :
Riege, N. ; Middlebrook, C. ; Buller, W. ; Roggemann, M.
Author_Institution :
Michigan Technol. Univ., Houghton, MI, USA
Abstract :
In this paper, sidewall slope and sidewall roughness of multimode polymer waveguides have been investigated using modeling and simulation techniques in order to determine fabrication tolerances and their impact on the overall optical system link budget. These tolerances can be used in the manufacturing process to determine where more time intensive and costly fabrication techniques must be utilized.
Keywords :
lithography; optical fabrication; optical polymers; optical waveguide theory; 3D beam propagation method; lithographic roughness; multimode polymer rectangular waveguides; optical fabrication; optical performance; surface roughness; Mathematical model; Optical device fabrication; Optical waveguides; Polymers; Surface roughness;
Conference_Titel :
Avionics Fiber-Optics and Photonics Technology Conference (AVFOP), 2010 IEEE
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-5312-2
Electronic_ISBN :
978-1-4244-5313-9
DOI :
10.1109/AVFOP.2010.5637743
