• DocumentCode
    3124511
  • Title

    The dEWMA fault tolerant approach for mixed product run-to-run control

  • Author

    Zheng, Ying ; Ai, Bing ; Wang, Yanwei ; Zhang, Hong

  • Author_Institution
    Dept. of Control Sci. & Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • fYear
    2009
  • fDate
    5-8 July 2009
  • Firstpage
    155
  • Lastpage
    160
  • Abstract
    Semiconductor manufacturing is an industry with high cost. Improvement of production efficiency is always an important goal for manufacturers. Run-to-run control has been widely used in batch manufacturing processes to reduce variations. Threaded EWMA run-to-run control is an important stable control scheme. In this paper mixed products are manufactured in cycles. However, the process outputs will oscillate greatly in the first runs of every cycle if the disturbance follows IMA(1,1) series with deterministic linear drift and the break length of a certain product is large enough. A double EWMA controller is adopted to handle the disturbance and the drift. Furthermore, how to deal with process fault is also considered in this paper. Two kinds of fault - the step and ramp fault are discussed for fault tolerant approach which can reduce the large deviation of output from the target. Simulation study showed that the proposed approaches are effective.
  • Keywords
    batch production systems; fault tolerance; moving average processes; production control; robust control; semiconductor device manufacture; batch manufacturing process; dEWMA fault tolerant approach; deterministic linear drift; disturbance controller; double EWMA controller; drift controller; exponentially weighted moving average algorithm; mixed product run-to-run control; process fault; product break length; ramp fault; semiconductor manufacturing industry; stable control; step fault; Batch production systems; Costs; Fault tolerance; Industrial electronics; Machine control; Manufacturing industries; Mean square error methods; Process control; Pulp manufacturing; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industrial Electronics, 2009. ISIE 2009. IEEE International Symposium on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-4347-5
  • Electronic_ISBN
    978-1-4244-4349-9
  • Type

    conf

  • DOI
    10.1109/ISIE.2009.5218253
  • Filename
    5218253