DocumentCode
3124860
Title
Heavy ion irradiation of floating gate memory cells
Author
Cellere, G. ; Paccagnella, A. ; Caprara, P. ; Visconti, A.
Author_Institution
Padova Univ., Italy
fYear
2004
fDate
2004
Firstpage
287
Lastpage
290
Abstract
We have shown results on irradiation of EPROM and Flash devices with Ag and I ions. Bit flip are seldom observed in FG memories, because the control circuitry is by far more radiation sensitive than the memory array itself. Nevertheless, we have shown that, after heavy ions irradiation, cells may experience large threshold voltage shifts. Drain current or threshold voltage shifts are randomly distributed across the device. In particular, charge loss detected after a heavy ion stroke a FG is too large to be described by existing models. The aim of future work is to extend the understanding of the physical mechanism underlying charge loss from the programmed FG.
Keywords
EPROM; current distribution; flash memories; ion beam effects; radiation hardening (electronics); EPROM; charge loss; cumulative distributions; drain current shifts; flash arrays; floating gate memory cells; heavy ion irradiation; large threshold voltage shifts; spatial current distribution; Charge carrier processes; EPROM; Electrons; Integrated circuit synthesis; Integrated circuit technology; Microelectronics; Nonvolatile memory; Radiative recombination; Space technology; Spontaneous emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Circuit Design and Technology, 2004. ICICDT '04. International Conference on
Print_ISBN
0-7803-8528-4
Type
conf
DOI
10.1109/ICICDT.2004.1309964
Filename
1309964
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