DocumentCode :
3124996
Title :
The integration of SnO2 thin-film onto micro-hotplate for gas sensor applications
Author :
Sheng, Lie-yi ; Chan, Philip C.H. ; Sin, Johny K O
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong
fYear :
1997
fDate :
35672
Firstpage :
145
Lastpage :
148
Abstract :
Anisotropic silicon etching techniques have been widely used in various microsensors to create thermally isolated structures or micro-hotplate (MHP). EDP (Ethylene-diamine-pyrocatechol) is one of the most commonly used anisotropic etchants because of its high selectivity of silicon compared to masking materials such as silicon dioxide. To integrate sensor arrays of various types of SnO2 thin-film sensors on the microstructure, we need to find a way to photolithographically pattern the SnO2 thin-film. In this paper we report results from such experiments
Keywords :
etching; gas sensors; microsensors; photolithography; semiconductor thin films; tin compounds; EDP; SnO2; SnO2 thin film; anisotropic etching; ethylene-diamine-pyrocatechol; gas sensor; micro-hotplate; microsensor; photolithography; Anisotropic magnetoresistance; Etching; Fabrication; Gas detectors; Microsensors; Microstructure; Resists; Sensor arrays; Silicon; Silicon compounds; Sputtering; Thin film sensors; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1997. Proceedings., 1997 IEEE Hong Kong
Print_ISBN :
0-7803-3802-2
Type :
conf
DOI :
10.1109/HKEDM.1997.642352
Filename :
642352
Link To Document :
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