DocumentCode
3127425
Title
Highly sensitive assessment of dry etch damage by measuring microdisk resonator Q
Author
Lee, K.-H. ; Wang, C.F. ; Choi, Y.-S. ; Hennessy, K.J. ; Hu, E.L. ; He, J. ; Petroff, P.M.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA
fYear
2006
fDate
Oct. 2006
Firstpage
324
Lastpage
325
Abstract
We discuss a novel optical assessment of dry etch damage, with high degree of sensitivity, by measuring the microdisk resonator Q. Effects of etch gas composition, bias power and sample preparation (resist reflow) were examined
Keywords
etching; micro-optics; optical fabrication; optical resonators; optical testing; optoelectronic devices; degree of sensitivity; dry etch damage assessment; etch gas composition effects; microdisk resonator Q; optical assessment; quality factor measurement; resist reflow; sample preparation; Dry etching; Fabrication; Gallium arsenide; Optical resonators; Optical sensors; Photoluminescence; Physics; Q measurement; Resists; Wet etching; Nanotechnology; photoluminescence; quantum effect semiconductor devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2006. LEOS 2006. 19th Annual Meeting of the IEEE
Conference_Location
Montreal, Que.
Print_ISBN
0-7803-9555-7
Electronic_ISBN
0-7803-9555-7
Type
conf
DOI
10.1109/LEOS.2006.279097
Filename
4054188
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