Title :
Highly sensitive assessment of dry etch damage by measuring microdisk resonator Q
Author :
Lee, K.-H. ; Wang, C.F. ; Choi, Y.-S. ; Hennessy, K.J. ; Hu, E.L. ; He, J. ; Petroff, P.M.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA
Abstract :
We discuss a novel optical assessment of dry etch damage, with high degree of sensitivity, by measuring the microdisk resonator Q. Effects of etch gas composition, bias power and sample preparation (resist reflow) were examined
Keywords :
etching; micro-optics; optical fabrication; optical resonators; optical testing; optoelectronic devices; degree of sensitivity; dry etch damage assessment; etch gas composition effects; microdisk resonator Q; optical assessment; quality factor measurement; resist reflow; sample preparation; Dry etching; Fabrication; Gallium arsenide; Optical resonators; Optical sensors; Photoluminescence; Physics; Q measurement; Resists; Wet etching; Nanotechnology; photoluminescence; quantum effect semiconductor devices;
Conference_Titel :
Lasers and Electro-Optics Society, 2006. LEOS 2006. 19th Annual Meeting of the IEEE
Conference_Location :
Montreal, Que.
Print_ISBN :
0-7803-9555-7
Electronic_ISBN :
0-7803-9555-7
DOI :
10.1109/LEOS.2006.279097
