• DocumentCode
    3127669
  • Title

    A 4.9-dB NF 53.5–62-GHz micro-machined CMOS wideband LNA with small group-delay-variation

  • Author

    Lin, Yashen ; Chen, Ci ; Huang, Pei-Yu ; Lu, Siyu ; Chang, Joana

  • Author_Institution
    National Chi Nan University, Puli, Taiwan
  • fYear
    2010
  • fDate
    23-28 May 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    A 53.5–62-GHz wideband CMOS LNA with excellent phase linearity property is reported. Current-sharing technique is adopted to reduce power dissipation. The LNA (STD LNA) consumed 29.1 mW and achieved input return loss (S11) of −10.3∼−19.5 dB, output return loss (S22) of −13.8∼−27.8 dB, forward gain (S21) of 8.1∼11.1 dB, and reverse isolation (S12) of −49.9∼−60.2 dB over the 53.5–62-GHz-band. The minimum NF (NFmin) is 5.4 dB at 62 GHz. To reduce the substrate loss, the CMOS process compatible backside inductively-coupled-plasma (ICP) deep trench technology is used to remove the silicon underneath the LNA. After the ICP etching, the LNA (ICP LNA) achieved maximum S21 (S21-max) of 13.2 dB, 2.1 dB higher than that (11.1 dB) of the STD LNA. In addition, the ICP LNA achieved NFmin of 4.9 dB, 0.5 dB lower than that (5.4 dB) of the STD LNA. These results demonstrate the proposed LNA architecture in conjunction with the backside ICP technology is very promising for 60-GHz-band RFIC applications.
  • Keywords
    CMOS process; CMOS technology; Etching; Gain; Isolation technology; Linearity; Noise measurement; Power dissipation; Silicon; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
  • Conference_Location
    Anaheim, CA
  • ISSN
    0149-645X
  • Print_ISBN
    978-1-4244-6056-4
  • Electronic_ISBN
    0149-645X
  • Type

    conf

  • DOI
    10.1109/MWSYM.2010.5516747
  • Filename
    5516747