DocumentCode :
3127669
Title :
A 4.9-dB NF 53.5–62-GHz micro-machined CMOS wideband LNA with small group-delay-variation
Author :
Lin, Yashen ; Chen, Ci ; Huang, Pei-Yu ; Lu, Siyu ; Chang, Joana
Author_Institution :
National Chi Nan University, Puli, Taiwan
fYear :
2010
fDate :
23-28 May 2010
Firstpage :
1
Lastpage :
1
Abstract :
A 53.5–62-GHz wideband CMOS LNA with excellent phase linearity property is reported. Current-sharing technique is adopted to reduce power dissipation. The LNA (STD LNA) consumed 29.1 mW and achieved input return loss (S11) of −10.3∼−19.5 dB, output return loss (S22) of −13.8∼−27.8 dB, forward gain (S21) of 8.1∼11.1 dB, and reverse isolation (S12) of −49.9∼−60.2 dB over the 53.5–62-GHz-band. The minimum NF (NFmin) is 5.4 dB at 62 GHz. To reduce the substrate loss, the CMOS process compatible backside inductively-coupled-plasma (ICP) deep trench technology is used to remove the silicon underneath the LNA. After the ICP etching, the LNA (ICP LNA) achieved maximum S21 (S21-max) of 13.2 dB, 2.1 dB higher than that (11.1 dB) of the STD LNA. In addition, the ICP LNA achieved NFmin of 4.9 dB, 0.5 dB lower than that (5.4 dB) of the STD LNA. These results demonstrate the proposed LNA architecture in conjunction with the backside ICP technology is very promising for 60-GHz-band RFIC applications.
Keywords :
CMOS process; CMOS technology; Etching; Gain; Isolation technology; Linearity; Noise measurement; Power dissipation; Silicon; Wideband;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
ISSN :
0149-645X
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2010.5516747
Filename :
5516747
Link To Document :
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