DocumentCode
3128598
Title
25 nm CMOS Omega FETs
Author
Fu-Liang Yang ; Hao-Yu Chen ; Fang-Cheng Chen ; Cheng-Chuan Huang ; Chang-Yun Chang ; Hsien-Kuang Chiu ; Chi-Chuang Lee ; Chi-Chun Chen ; Huan-Tsung Huang ; Chih-Jian Chen ; Hun-Jan Tao ; Yee-Chia Yeo ; Mong-Song Liang ; Chenming Hu
Author_Institution
Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan
fYear
2002
fDate
8-11 Dec. 2002
Firstpage
255
Lastpage
258
Abstract
Low leakage and low active-power 25 nm gate length C-MOSFETs are demonstrated for the first time with a newly proposed Omega-(/spl Omega/) shaped structure, at a conservative 17-19 /spl Aring/ gate oxide thickness, and with excellent hot carrier immunity. For 1 volt operation, the transistors give drive currents of 1440 /spl mu/A//spl mu/m and 780 /spl mu/A//spl mu/m with off state leakage currents of 8 nA//spl mu/m and 0.4 nA//spl mu/m for N-FET and P-FET, respectively. A low voltage version achieves, at 0.7 V, drive currents of 1300 /spl mu/A//spl mu/m for N-FET and 550 /spl mu/A//spl mu/m for P-FET at an off current of 1 /spl mu/A//spl mu/m. N-FET gate delay (CV/I) of 0.39 ps and P-FET gate delay of 0.88 ps exceed International Technology Roadmap for Semiconductors (ITRS) projections.
Keywords
CMOS integrated circuits; MOSFET; VLSI; hot carriers; leakage currents; low-power electronics; nanoelectronics; 0.7 V; 1 V; 17 to 19 A; 25 nm; CMOS Omega FETs; CMOSFETs; Omega-shaped structure; hot carrier immunity; low active-power MOSFETs; low leakage MOSFETs; low voltage version; n-FET; p-FET; Delay; FETs; FinFETs; Hot carriers; Immune system; Leakage current; MOSFETs; Manufacturing industries; Semiconductor device manufacture; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2002. IEDM '02. International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-7462-2
Type
conf
DOI
10.1109/IEDM.2002.1175826
Filename
1175826
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