Title :
Effect of passivation opening design on electromigration reliability issue in flip-chip solder joints
Author :
Chen, Tzu Yu ; Liang, S.W. ; Chen, Chih
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chiao Tong Univ., Hsinchu, Taiwan
Abstract :
This study investigates the effect of passivation opening design on electromigration reliability issue in flip-chip solder joints by using statistical analysis. Eutectic SnAg solder joints were used in this study with two different filling condition of polyimide (PI), ie with or without contact opening. The bump height is 50 ¿m. The four point probe method was used to monitor the bump resistance of a specific solder joint with downward election flow, under 0.8 A at 155°C. The failure criteria are defined as the resistances rose to 1.2 times and 2 times of their initial values. In addition, three-dimensional finite element analysis (3D-FEA) was employed to show the distribution of current density, and the different failure modes were also discussed. The solder joints without PI performed longer failure time from the statistical analysis results. In other words, the set without PI shows better reliability than that with PI.
Keywords :
finite element analysis; flip-chip devices; solders; statistical analysis; 3D finite element analysis; bump height; bump resistance; current density; electromigration reliability; eutectic SnAg solder joints; failure criteria; flip-chip solder joints; four point probe method; passivation opening design; polyimide; statistical analysis; Condition monitoring; Electromigration; Filling; Flip chip solder joints; Nominations and elections; Passivation; Polyimides; Probes; Soldering; Statistical analysis;
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-4341-3
Electronic_ISBN :
978-1-4244-4342-0
DOI :
10.1109/IMPACT.2009.5382121