DocumentCode :
3132098
Title :
Is your gas filter as clean as you think? Evaluation of UHP gas filters of differing membrane types for contamination contribution
Author :
Colorado, Arniando ; Vakhshoori, Kareem
Author_Institution :
Millipore Microelectron. Inc., Allen, TX, USA
fYear :
2001
fDate :
2001
Firstpage :
115
Lastpage :
120
Abstract :
The use of point-of-use (POU) filters will help achieve the most stringent purity requirements specified for the manufacture of future devices. Gas filter manufacturers will be faced with many challenges as tolerances to critical impurities and particles significantly decrease. Of all impurities, moisture concerns equipment and process engineers most. Moisture can interact with specialty gases to generate particles, which negatively impact other components such as mass flow controllers and transducers. Moisture in a corrosive gas can lead to corrosion and contribute to particulate contamination. Moisture adsorbs strongly to surfaces such as stainless steel; therefore, a filter that contributes a significant amount of moisture requires a significant amount of purge time, resulting in process delays. In this paper, two groups of filters undergo four performance-based evaluations: out-of-package initial outgassing, 24-hour ambient air exposure, flow/differential pressure determination and particle shed cleanliness. Group 1 (30 slpm) filters consisted of two metal and one ceramic filters while Group 2 (10-15 slpm) consisted of one prototype chromium, one nickel and two stainless steel filters. Results showed the nickel (group 1) and chromium (group 2) membranes contributed the least amount of contamination within their respective groups. The chromium membrane required the least purge time as it reached <10 ppb moisture concentration 90 minutes after installation on a gas panel
Keywords :
adsorption; corrosion; environmental testing; filtration; integrated circuit technology; integrated circuit testing; membranes; moisture; outgassing; surface contamination; surface treatment; 24 hr; 90 min; Cr; Ni; UHP gas filters; ambient air exposure; ceramic filters; chromium filter; contamination; contamination contribution; corrosion; corrosive gas; critical impurity tolerance; device manufacture; filter moisture contribution; filter performance-based evaluations; flow/differential pressure determination; gas filter cleanliness; gas panel installation; mass flow controllers; membrane types; membranes; metal filters; moisture; moisture adsorption; moisture concentration; nickel filter; out-of-package initial outgassing; particle generation; particle shed cleanliness; particle tolerance; particulate contamination; point-of-use filters; process delays; purge time; purity requirements; specialty gases; stainless steel; stainless steel filters; transducers; Biomembranes; Chromium; Contamination; Filters; Gases; Impurities; Manufacturing; Moisture; Nickel; Steel;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2001 IEEE/SEMI
Conference_Location :
Munich
ISSN :
1078-8743
Print_ISBN :
0-7803-6555-0
Type :
conf
DOI :
10.1109/ASMC.2001.925628
Filename :
925628
Link To Document :
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