DocumentCode :
3132162
Title :
Non-contact wafer handling using high-intensity ultrasonics
Author :
Reinhart, Gunther ; Hoeppner, Juergen ; Zimmermann, Josef
fYear :
2001
fDate :
2001
Firstpage :
139
Lastpage :
140
Abstract :
Increasing requirements placed on the handling of parts in semiconductor fabrication necessitate the development of new innovative methods to handle wafers as fragile and surface-sensitive substrates. In order to avoid the inherent disadvantages of tactile handling, it makes sense to manipulate wafers or substrates without physical contact. This is where the technology of acoustic levitation offers itself as a suitable approach. Basically, two physical effects can be utilized: while work pieces can be positioned and manipulated within a standing wave pattern, the application of the principle of near field levitation also makes it possible to design nontactile handling systems, both of which are presented in this paper
Keywords :
integrated circuit manufacture; integrated circuit technology; materials handling; position control; semiconductor technology; ultrasonic applications; ultrasonic effects; acoustic levitation; component handling; fragile surface-sensitive substrates; high-intensity ultrasonics; near field levitation; noncontact wafer handling; nontactile handling systems; physical effects; semiconductor fabrication; standing wave pattern; tactile handling; wafer handling; wafer manipulation; work piece manipulation; work piece positioning; Acoustic beams; Acoustic waves; Assembly; Conductors; Fabrication; Feeds; Levitation; Pulp manufacturing; Semiconductor device manufacture; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2001 IEEE/SEMI
Conference_Location :
Munich
ISSN :
1078-8743
Print_ISBN :
0-7803-6555-0
Type :
conf
DOI :
10.1109/ASMC.2001.925636
Filename :
925636
Link To Document :
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