DocumentCode :
3132221
Title :
Effect of electroless palladium immersion gold deposit properties on gold wire bonding
Author :
Dennis, K. W. ; Yee, S. L. ; Leung Martin Bayes
Author_Institution :
DOW Electronic Materials, USA
fYear :
2009
fDate :
21-23 Oct. 2009
Firstpage :
629
Lastpage :
632
Abstract :
Microelectronic wire bonding is a widely used and cost effective manufacturing process used to electrically connect integrated circuits (IC) with printed circuit boards (PCBs) or other substrates. The first bond is formed on the chip side and the second bond at the circuit board side. The choice of wire bondable surface finishes used on the circuit board can have a great impact on the reliability of the device. Electroless nickel electroless palladium immersion gold (ENEPIG) is one of the available wirebondable finishes and has been applied in these applications for some time. Although the rate of adoption of ENEPIG has been limited, it is attracting more interest due to increased gold prices, as a replacement for electrolytic nickel gold. This paper will present experimental data that demonstrates the capability of ENEPIG as a versatile surface finish providing reliable gold wire bonding performance. It also confirms that ENEPIG is a viable alternative to electrolytic nickel/gold.
Keywords :
electroless deposition; gold; integrated circuit bonding; integrated circuit reliability; lead bonding; nickel; palladium; printed circuits; surface finishing; ENEPIG; cost effective manufacturing process; electroless nickel electroless palladium immersion gold; electroless palladium immersion gold deposit property; electrolytic nickel gold; gold wire bonding performance; integrated circuits; microelectronic wire bonding; printed circuit boards; wire bondable surface finishes; wirebondable finishes; Bonding; Costs; Gold; Manufacturing processes; Microelectronics; Nickel; Palladium; Printed circuits; Surface finishing; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-4341-3
Electronic_ISBN :
978-1-4244-4342-0
Type :
conf
DOI :
10.1109/IMPACT.2009.5382264
Filename :
5382264
Link To Document :
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