Abstract :
The following topics are dealt with: advance device/integration; junction modelling/simulation; doping/shallow juntion; silicides/germanides; advanced equipments; impurity atoms activation.
Keywords :
impurities; semiconductor devices; semiconductor doping; semiconductor junctions; advance device/integration; advanced equipments; doping; germanides; impurity atoms activation; junction modeling; junction simulation; junction technology; shallow junction; silicides;
Conference_Titel :
Junction Technology, 2007 International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
1-4244-1103-3
DOI :
10.1109/IWJT.2007.4279929
