Title :
Spinodal-like decomposition of InGaAsP/InP grown by gas source molecular beam epitaxy
Author :
LaPierre, R.R. ; Okada, T. ; Robinson, B.J. ; Thompson, D.A. ; Weatherly, G.C.
Author_Institution :
Centre for Electrophotonic Mater. & Devices, McMaster Univ., Hamilton, Ont., Canada
Abstract :
Transmission electron microscopy (TEM), photoluminescence (PL), and X-ray diffraction (XRD) have been used to characterize GSMBE grown InI-xGaxAsyP1-y/InP layers in terms of a spinodal-like decomposition. Because tensile layers lie deeper within the spinodal isotherm, they were observed to have far more decomposition than lattice-matched or compressively strained layers. Reducing growth temperature, increasing group V overpressure, and the use of (311)B oriented substrates were found to reduce the decomposition in lattice-matched layers indicating the role of surface kinetics in limiting the decomposition. These same efforts are expected to improve the quality of tensile strained layers to facilitate their incorporation in various strained layer structures
Keywords :
III-V semiconductors; X-ray diffraction; chemical beam epitaxial growth; gallium arsenide; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; spinodal decomposition; transmission electron microscopy; (311)B oriented substrates; GSMBE grown InI-xGaxAsyP1-y /InP layers; InGaAsP/InP; InP; TEM; X-ray diffraction; XRD; compressively strained layers; gas source molecular beam epitaxy; group V overpressure; growth temperature; lattice-matched layers; photoluminescence; quality; spinodal isotherm; spinodal-like decomposition; strained layer structures; surface kinetics; tensile layers; transmission electron microscopy; Electrons; Epitaxial layers; Indium phosphide; Kinetic theory; Lattices; Molecular beam epitaxial growth; Photonic band gap; Substrates; Temperature; X-ray scattering;
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
DOI :
10.1109/ICIPRM.1995.522107