DocumentCode :
3133091
Title :
Electroplating equipment design considerations for copper microvia filling
Author :
Lefebvre, Mark ; Najjar, Elie ; Gomez, Luis ; Barstad, Leon ; Chen, Bruce ; Bayes, Martin
Author_Institution :
Dow Electron. Mater., Dow Chem. Co., Marlborough, MA, USA
fYear :
2009
fDate :
21-23 Oct. 2009
Firstpage :
77
Lastpage :
80
Abstract :
Electrolytic copper microvia filling is an enabling technology, prominently used in today´s manufacture of advanced HDI and packaging substrate product. In the high volume mass production of copper filled microvias, a wide variety of electroplating equipment designs are available to the fabricator. In this article, various aspects of electroplating equipment design used in the mass production of copper filled microvias are discussed, including a comparison of continuous and batch systems, anode materials, solution delivery (convection), and copper replenishment. The impacts of these variables on microvia filling performance, plated through hole throwing power, surface distribution, trace profile and bath life are described.
Keywords :
electronics packaging; electroplating; HDI; copper microvia filling; electroplating equipment design; packaging substrate product; Copper; Filling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-4341-3
Electronic_ISBN :
978-1-4244-4342-0
Type :
conf
DOI :
10.1109/IMPACT.2009.5382313
Filename :
5382313
Link To Document :
بازگشت