• DocumentCode
    3133365
  • Title

    Emissivity independent heating of 3D patterns

  • Author

    Vanormelingen, K. ; Granneman, E.H.A. ; Terhorst, H. ; Rosseel, E. ; Verheyden, K.

  • Author_Institution
    ASM Belgium, Leuven
  • fYear
    2007
  • fDate
    8-9 June 2007
  • Firstpage
    141
  • Lastpage
    142
  • Abstract
    It has been shown that for radiative heating systems, 3D patterns have a strong influence on local wafer temperatures during anneal. Since the temperature gradients on the wafer increase with increasing heat up rates and aspect ratios, the importance of these effects is expected to grow when changing to future technology nodes. For conductive heating systems the effect of the 3D patterns is negligible.
  • Keywords
    annealing; emissivity; semiconductor technology; 3D heating patterns; conductive heating; die emissivity; radiative heating; size 300 mm; wafer temperature; Absorption; Annealing; Europe; Heating; Implants; Lamps; Optical films; Optical sensors; Surface topography; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology, 2007 International Workshop on
  • Conference_Location
    Kyoto
  • Print_ISBN
    1-4244-1103-3
  • Electronic_ISBN
    1-4244-1104-1
  • Type

    conf

  • DOI
    10.1109/IWJT.2007.4279969
  • Filename
    4279969
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3133365