Title :
Nano-scale ablation with a compact extreme ultraviolet laser
Author :
Menoni, C.S. ; Vaschenko, G. ; Bravo, H. ; Brizuela, F. ; Rocca, J.J. ; Chao, W. ; Anderson, E.H. ; Attwood, D.T. ; Hemberg, O. ; Frazer, B. ; Bloom, S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO
Abstract :
In this work we demonstrate the feasibility of directly ablating sub-100 nm holes using the focused extreme ultraviolet (EUV) wavelength output from a compact lambda=46.9 nm capillary discharge laser. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused extreme ultraviolet laser beam, opening a path for the development of new nanoprobes and nano-machining tools
Keywords :
argon; gas lasers; laser ablation; nanopatterning; 100 nm; 46.9 nm; Ar; argon laser; capillary discharge laser; focused extreme ultraviolet laser beam; nanomachining tools; nanopatterning; nanoprobes; nanoscale ablation; Argon; Diffraction; Focusing; Laser ablation; Laser beams; Laser theory; Optical attenuators; Surface emitting lasers; Ultraviolet sources; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics Society, 2006. LEOS 2006. 19th Annual Meeting of the IEEE
Conference_Location :
Montreal, Que.
Print_ISBN :
0-7803-9555-7
Electronic_ISBN :
0-7803-9555-7
DOI :
10.1109/LEOS.2006.279183
