• DocumentCode
    3133752
  • Title

    A comparative study of the low frequency noise in InP based heterojunction field effect transistors (HFETs)

  • Author

    Rojo-Romeo, P. ; Viktorovitch, P. ; Letartre, X. ; Tardy, J. ; Thomson, D. ; Simmons, J.G.

  • Author_Institution
    Lab. d´´Electron., Ecole Centrale de Lyon, Ecully, France
  • fYear
    1995
  • fDate
    9-13 May 1995
  • Firstpage
    385
  • Lastpage
    388
  • Abstract
    In this work we present a comparative study of the low frequency noise in different types of HFETs based on an InP substrate. Structures with different barriers (AlInAs, InP or a combination of both) and different channels (InGaAs, InGaAsP and InP) materials were investigated. Also, experiments on plain doped AlInAs and AlGaAs resistors were performed for comparison. This study concentrates on LFN sources induced by the distribution of traps within the different layers and interfaces which constitute the structures, resulting in channel carrier number fluctuations. Experiments were made on structures using a TLM configuration
  • Keywords
    1/f noise; III-V semiconductors; aluminium compounds; current fluctuations; defect states; gallium arsenide; high electron mobility transistors; indium compounds; interface states; semiconductor device noise; 1 Hz to 100 kHz; 1/f like noise; AlInAs-GaInAs; GaAlAs-GaInAs-GaAs; InP; InP based heterojunction field effect transistors; InP substrate; InP-GaInAs; MODFET; TLM configuration; barriers; channel carrier number fluctuations; channels; current noise spectrum; interface traps; low frequency noise; plain doped AlGaAs resistors; plain doped AlInAs resistors; room temperature; trap distribution; FETs; Gallium arsenide; HEMTs; Heterojunctions; Indium gallium arsenide; Indium phosphide; Length measurement; Low-frequency noise; MODFET circuits; Resistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
  • Conference_Location
    Hokkaido
  • Print_ISBN
    0-7803-2147-2
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1995.522160
  • Filename
    522160