DocumentCode :
31339
Title :
Role of Lateral Diffusion Current in Perimeter-Dependent Current of MOS(p) Tunneling Temperature Sensors
Author :
Yen-Kai Lin ; Hwu, Jenn-Gwo
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
61
Issue :
10
fYear :
2014
fDate :
Oct. 2014
Firstpage :
3562
Lastpage :
3565
Abstract :
P-type metal-oxide-semiconductor (MOS) tunneling temperature sensors with two different gate electrodes (area = 2.25×10-4 and 9 × 10-4 cm2) were examined with temperatures of 35 °C, 50 °C, 65 °C, and 80 °C. By investigating the current divided by area and perimeter, we found that the current under the inversion region is not dominated by the generation current but by the Schottky diode hole current at the edge of the device, which is induced by the temperature-dependent lateral electron diffusion current. This result reveals that the perimeter is a more important factor than the area in designing MOS tunneling temperature sensors, which can be properly integrated in CMOS technology.
Keywords :
MIS devices; Schottky diodes; electrodes; temperature sensors; tunnelling; CMOS technology; MOS(p) tunneling temperature sensor; Schottky diode hole current; gate electrode; inversion region; p-type metal-oxide-semiconductor tunneling temperature sensor; perimeter-dependent current; temperature 35 degC; temperature 50 degC; temperature 65 degC; temperature 80 degC; temperature-dependent lateral electron diffusion current; Charge carrier processes; Logic gates; Schottky diodes; Silicon; Temperature sensors; Tunneling; Hole current; Schottky diode; lateral diffusion; metal–oxide–semiconductor (MOS); metal-oxide-semiconductor (MOS); temperature sensors; tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2346238
Filename :
6879435
Link To Document :
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