DocumentCode :
3138462
Title :
Spectral characteristics of Si light emitting diodes in a 0.8 μm BiCMOS technology
Author :
du Plessis, M. ; Aharoni, H. ; Snyman, L.W.
Author_Institution :
Carl & Emily Fuchs Inst. for Microelectron., Pretoria Univ., South Africa
fYear :
1999
fDate :
1999
Firstpage :
228
Lastpage :
231
Abstract :
It is well known that silicon diodes biased in the avalanche breakdown region of operation emit visible light. Silicon light sources in monolithic optoelectronic systems will only be used on a large scale if the devices can be easily integrated with other circuits in the standard VLSI technology. This paper investigates the spectral properties of silicon diode light sources in a 0.8 μm BiCMOS technology. The light sources include both avalanche and field emission breakdown devices, and it Is shown that the breakdown mechanism has a significant effect on the spectral properties of the diodes. The emitted light patterns as defined by the layout also play a role, and evidence is provided that point sources have more long wavelength emission than line sources. The emission originating from bulk diodes, e.g. the buried layer, is also compared to the emission from surface-dominated junctions, and a definite shift in spectra towards longer wavelengths is observed
Keywords :
BiCMOS integrated circuits; VLSI; avalanche breakdown; buried layers; elemental semiconductors; integrated optoelectronics; light emitting diodes; semiconductor device breakdown; silicon; 0.8 mum; BiCMOS technology; Si; Si light emitting diodes; VLSI technology; avalanche breakdown region; buried layer; field emission breakdown devices; monolithic optoelectronic systems; spectral characteristics; spectral properties; surface-dominated junctions; Avalanche breakdown; BiCMOS integrated circuits; Integrated circuit technology; Large scale integration; Light emitting diodes; Light sources; Mechanical factors; Silicon; Surface waves; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
0-7803-4513-4
Type :
conf
DOI :
10.1109/COMMAD.1998.791627
Filename :
791627
Link To Document :
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