DocumentCode
3138616
Title
Observation of As carryover from two different As sources
Author
Moon, Youngboo ; Lee, Tae-Wan ; Yoon, Sukho ; Yoo, Kyeongran ; Yoon, Euijoon
Author_Institution
Sch. of Mater. Sci. & Eng., Seoul Nat. Univ., South Korea
fYear
1999
fDate
1999
Firstpage
264
Lastpage
267
Abstract
The As carryover processes from two different As sources were observed simultaneously but separately by photoluminescence (PL) and high resolution x-ray diffraction (HRXRD) in InAsxP1-x /InP single quantum wells (SQWs) formed by AsH3 exposure. One of the main As source of carryover, As absorbed on the epilayer surface, was observed by PL as a blue shift of peak energy with growth temperature. The other source, re-evaporated As from the interior of the reactor, was also detected in the same samples by an abnormal HRXRD rocking curve, and the concentration of As in the buffer layer was quite uniform though its amount was minute. Finally, it was briefly considered that how the two carryover processes were observed simultaneously, especially in this study
Keywords
III-V semiconductors; MOCVD; X-ray diffraction; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum wells; spectral line shift; vapour phase epitaxial growth; As carryover; As concentration; AsH3; AsH3 exposure; InAsP-InP; MOCVD; blue shift; epilayer surface; growth temperature; high resolution X-ray diffraction; photoluminescence; single quantum wells; Ash; Buffer layers; Indium phosphide; Inductors; MOCVD; Moon; Photoluminescence; Surface treatment; Temperature; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location
Perth, WA
Print_ISBN
0-7803-4513-4
Type
conf
DOI
10.1109/COMMAD.1998.791637
Filename
791637
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