• DocumentCode
    3139056
  • Title

    A comparative study of GaAs/AlGaAs quantum well infrared photodetectors grown by molecular beam epitaxy and metal organic vapour phase epitaxy

  • Author

    Johnston, M.B. ; Dao, L.V. ; Gal, M. ; Lumpkin, N.E. ; Clark, R.G. ; Lan, F. ; Tan, H.H. ; Jagadish, C. ; Li, Na ; Chen, Zhanghai ; Liu, Xingquan ; Li, Ning ; Lu, Wei ; Shen, S.C.

  • Author_Institution
    Sch. of Phys., New South Wales Univ., Sydney, NSW, Australia
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    348
  • Lastpage
    351
  • Abstract
    Quantum well infrared photodetector (QWIP) structures were grown by metal organic vapour phase epitaxy (MOVPE) and molecular beam epitaxy (MBE). These n-type QWIP structures were fabricated into devices. Inter-subband and inter-band transition energies were measured using photoresponse and photoluminescence spectroscopy. The carrier dynamics of one of the structures was analysed using temperature dependent up-conversion spectroscopy. These results were modelled with the solution of a three level system. Measurement of an n-type QWIP allows us to determine the inter-subband relaxation time of a p-type QWIP. The intersubband relaxation time of a p-type QWIP with 3 nm wide wells was determined to be 15 ps
  • Keywords
    III-V semiconductors; MOCVD coatings; aluminium compounds; gallium arsenide; molecular beam epitaxial growth; photodetectors; photoluminescence; semiconductor growth; semiconductor quantum wells; vapour phase epitaxial growth; 1.5 ps; 3 nm; GaAs-AlGaAs; GaAs/AlGaAs quantum well infrared photodetectors; carrier dynamics; inter-band transition energies; inter-subband transition energies; metal organic vapour phase epitaxy; molecular beam epitaxy; photoluminescence; photoresponse; Energy measurement; Epitaxial growth; Epitaxial layers; Gallium arsenide; Molecular beam epitaxial growth; Photodetectors; Photoluminescence; Semiconductor process modeling; Spectroscopy; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    0-7803-4513-4
  • Type

    conf

  • DOI
    10.1109/COMMAD.1998.791659
  • Filename
    791659