DocumentCode
3139142
Title
Intermixing induced resonance shift in GaAs/AlxOy DBR resonators
Author
Cohen, M.I. ; Tan, H.H. ; Jagadish, C.
Author_Institution
Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
fYear
1999
fDate
1999
Firstpage
365
Lastpage
368
Abstract
The effect of ion induced interdiffusion on the resonant wavelength of GaAs/AlxOy DBRs is investigated. As interdiffusion becomes stronger, the resonant wavelength is seen to red-shift. Resonance shifts of greater than 30 nm were observed. A model is proposed to explain this behaviour. This model agrees well with previous lateral oxidation studies
Keywords
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium arsenide; laser cavity resonators; red shift; semiconductor lasers; semiconductor-insulator boundaries; surface diffusion; GaAs-AlO; GaAs/AlxOy DBR resonators; intermixing induced resonance shift; ion induced interdiffusion; lateral oxidation; red-shift; resonant wavelength; Distributed Bragg reflectors; Gallium arsenide; Laser tuning; Optical resonators; Oxidation; Reflectivity; Refractive index; Resonance; Semiconductor laser arrays; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location
Perth, WA
Print_ISBN
0-7803-4513-4
Type
conf
DOI
10.1109/COMMAD.1998.791664
Filename
791664
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