Title :
UV-LIGA: a promising and low-cost variant for microsystem technology
Author :
Qu, Wenmin ; Wenzel, Christian ; Jahn, Andreas ; Zeidler, Dieter
Author_Institution :
Inst. for Semicond. & Microsyst. Technol., Tech. Univ. Dresden, Germany
Abstract :
A low-cost surface microstructuring technique is described and examples provided of its recent application. The new technology, UV-LIGA combines depth UV lithographic patterning of very thick photoresists and electrodepositing of structural materials into the patterned resist moulds. Both UV lithography and electrodeposition do not need any expensive or special equipment. Movable three dimensional microstructures with a high aspect ratio can be obtained by combining the UV-LIGA process with a sacrificial layer technique. As an example of the advanced application in microsystems, fabrication of 3D accelerometers has been presented, using titanium as a sacrificial layer and nickel as the structural material
Keywords :
LIGA; accelerometers; electrodeposition; micromachining; microsensors; nickel; photoresists; titanium; ultraviolet lithography; 3D accelerometers; Ni-Ti; UV-LIGA; depth UV lithographic patterning; electrodeposition; high aspect ratio; low-cost; low-cost surface microstructuring technique; microsystem technology; nickel structural material; patterned resist moulds; sacrificial layer technique; thick photoresists; three dimensional microstructures; titanium sacrificial layer; Accelerometers; Coatings; Fabrication; Lithography; Microelectronics; Microstructure; Optical surface waves; Resists; Semiconductor materials; Ultraviolet sources;
Conference_Titel :
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
0-7803-4513-4
DOI :
10.1109/COMMAD.1998.791668