DocumentCode
3139354
Title
Unstressed nickel chromium thin films for thermo-optic application
Author
di Mola, D. ; Brioschi, L. ; Carrera, A. ; Fusari, F. ; Lenzi, M. ; Ongaro, G.
Author_Institution
Italtel Soc. Italiana Telecommun. SpA, Milan, Italy
fYear
1999
fDate
1999
Firstpage
411
Lastpage
414
Abstract
The sputtering deposition technique has been used to realize nickel chromium thin films up to 12000 Å thick. The radio frequency biasing of the silica substrate has been implemented to control the film stress. Application of these films used as “heater electrodes” in thermo-optical devices has been reported
Keywords
chromium alloys; internal stresses; metallic thin films; nickel alloys; resistance heating; sputter deposition; thermo-optical effects; 12000 A; NiCr; film stress; heater electrodes; radio frequency biasing; silica substrate; sputtering deposition technique; thermo-optic application; thermo-optical devices; unstressed nickel chromium thin films; Chromium; Nickel; Radio control; Radio frequency; Silicon compounds; Sputtering; Stress control; Substrates; Thermooptical devices; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location
Perth, WA
Print_ISBN
0-7803-4513-4
Type
conf
DOI
10.1109/COMMAD.1998.791676
Filename
791676
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