Title :
Unstressed nickel chromium thin films for thermo-optic application
Author :
di Mola, D. ; Brioschi, L. ; Carrera, A. ; Fusari, F. ; Lenzi, M. ; Ongaro, G.
Author_Institution :
Italtel Soc. Italiana Telecommun. SpA, Milan, Italy
Abstract :
The sputtering deposition technique has been used to realize nickel chromium thin films up to 12000 Å thick. The radio frequency biasing of the silica substrate has been implemented to control the film stress. Application of these films used as “heater electrodes” in thermo-optical devices has been reported
Keywords :
chromium alloys; internal stresses; metallic thin films; nickel alloys; resistance heating; sputter deposition; thermo-optical effects; 12000 A; NiCr; film stress; heater electrodes; radio frequency biasing; silica substrate; sputtering deposition technique; thermo-optic application; thermo-optical devices; unstressed nickel chromium thin films; Chromium; Nickel; Radio control; Radio frequency; Silicon compounds; Sputtering; Stress control; Substrates; Thermooptical devices; Transistors;
Conference_Titel :
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
0-7803-4513-4
DOI :
10.1109/COMMAD.1998.791676
