DocumentCode :
3139377
Title :
Selective oxidation of vanadium thin film surfaces using an atomic force microscope
Author :
Sakata, Seiji ; Vaccaro, Pablo O. ; Yamaoka, Shinji ; Umezu, Ikurou ; Sugimura, Akira
Author_Institution :
ATR Adaptive Commun. Res. Labs., Kyoto, Japan
fYear :
1999
fDate :
1999
Firstpage :
419
Lastpage :
421
Abstract :
We successfully applied the atomic force microscope nano-oxidation process to vanadium thin films for the first time. The oxidized lines were narrower and higher than those of titanium thin films processed under the same conditions, These results show that vanadium is an interesting alternative material for the fabrication of metal/insulator-based nanodevices
Keywords :
atomic force microscopy; metal-insulator boundaries; metallic thin films; nanotechnology; oxidation; vanadium; V; V2O5; atomic force microscope; metal/insulator-based nanodevices; nano-oxidation process; oxidized lines; selective oxidation; vanadium thin film surfaces; Atomic force microscopy; Fabrication; Inorganic materials; Niobium; Oxidation; Surface morphology; Surface topography; Titanium; Transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
0-7803-4513-4
Type :
conf
DOI :
10.1109/COMMAD.1998.791678
Filename :
791678
Link To Document :
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