• DocumentCode
    3139377
  • Title

    Selective oxidation of vanadium thin film surfaces using an atomic force microscope

  • Author

    Sakata, Seiji ; Vaccaro, Pablo O. ; Yamaoka, Shinji ; Umezu, Ikurou ; Sugimura, Akira

  • Author_Institution
    ATR Adaptive Commun. Res. Labs., Kyoto, Japan
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    419
  • Lastpage
    421
  • Abstract
    We successfully applied the atomic force microscope nano-oxidation process to vanadium thin films for the first time. The oxidized lines were narrower and higher than those of titanium thin films processed under the same conditions, These results show that vanadium is an interesting alternative material for the fabrication of metal/insulator-based nanodevices
  • Keywords
    atomic force microscopy; metal-insulator boundaries; metallic thin films; nanotechnology; oxidation; vanadium; V; V2O5; atomic force microscope; metal/insulator-based nanodevices; nano-oxidation process; oxidized lines; selective oxidation; vanadium thin film surfaces; Atomic force microscopy; Fabrication; Inorganic materials; Niobium; Oxidation; Surface morphology; Surface topography; Titanium; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    0-7803-4513-4
  • Type

    conf

  • DOI
    10.1109/COMMAD.1998.791678
  • Filename
    791678
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3139377