Title :
Optimization of broadband drain modulation in GaN HEMT devices
Author :
Srinidhi, E.R. ; Ma, R. ; Markos, A.Z. ; Kompa, G.
Author_Institution :
Univ. of Kassel, Kassel
Abstract :
This paper focuses on the optimization of broadband envelope termination for reliable device characterization for future UMTS-LTE systems. Drain bias modulation is suppressed in 8times500 mum GaN HEMT using compensation network overcoming the parasitic effects of the DC feed, generally ignored during broadband measurements. Drain modulation index (DMI) metric is defined for quantifying the extent of drain voltage modulation as a function of carrier spacing and up to 80% reduction in DMI is achieved after drain bias compensation. Further, based on the experimental analysis, a simple bias tee is designed which can overcome improper DC feed conditions. Under 2-carrier CW and W-CDMA excitation, maximum of 19 dB and 18 dB IMD3 suppression together with the minimization of IMD asymmetry, were achieved using in- house bias tee, emphasizing the importance of broadband bias network design.
Keywords :
3G mobile communication; broadband networks; code division multiple access; compensation; gallium compounds; high electron mobility transistors; modulation; optimisation; semiconductor device reliability; 2-carrier CW excitation; GaN; HEMT devices; UMTS-LTE systems; W-CDMA excitation; bias tee; broadband drain bias modulation; carrier spacing; compensation network; optimization; reliable device characterization; Bandwidth; Baseband; Distortion measurement; Feeds; Gallium nitride; HEMTs; Impedance; Multiaccess communication; Nonlinear distortion; Voltage;
Conference_Titel :
Radio and Wireless Symposium, 2008 IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
978-1-4244-1462-8
Electronic_ISBN :
978-1-4244-1463-5
DOI :
10.1109/RWS.2008.4463433