DocumentCode :
3139777
Title :
The deposition and processing of thin film ceramics
Author :
Blamire, M.G.
Author_Institution :
Dept. of Mater. Sci., Cambridge Univ., UK
fYear :
1997
fDate :
35748
Firstpage :
42401
Lastpage :
42402
Abstract :
The deposition and processing of thin film ceramics is an area of rapid technological development. Applications include piezoelectric sensors and devices, high dielectric capacitors, high temperature superconductors. and a variety of materials aimed at the uncooled thermal imager market. By comparison with metals and semiconductors, electroceramics are difficult to deposit in a form which can deliver the bulk properties of the material; for instance PZT which has desirable piezoelectric and ferroelectric properties in bulk, but has required extensive process development to achieve even modest properties in thin film form. This presentation will summarise the various deposition processes which have been developed to improve the qualities and cost-effectiveness of thin film electroceramics and identify areas of current development
Keywords :
piezoceramics; CVD; cost-effectiveness; electroceramics; film deposition; film integration; film microstructure; laser ablation; piezoceramics; processing; sputter deposition; thin film ceramics;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Electro-technical Ceramics - Processing, Properties and Applications (Ref. No: 1997/317), IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19971049
Filename :
660638
Link To Document :
بازگشت