Title :
Frequency trimming and Q-factor enhancement of micromechanical resonators via localized filament annealing
Author :
Wang, Kun ; Wong, Ark-Chew ; Hsu, Wan-Thai ; Nguyen, Clark T -C
Author_Institution :
Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI, USA
Abstract :
A batch-compatible, post-fabrication annealing technique based upon filament-like heating of microstructures is demonstrated as an effective means for trimming the resonance frequencies (f0´s) and increasing the quality factors (Q´s) of surface-micromachined, polysilicon, mechanical resonators. Although the technique is straightforward, involving the mere application of a suitable voltage between the anchors of a micromechanical resonator, it provides a substantial range of adjustment, with frequency trims of over 2.7% and Q increases of up to 600%, depending upon resonator fabrication history. By pulsing the anneal voltage waveforms, controlled frequency trims of less than 16 ppm per trial are achievable
Keywords :
Q-factor; annealing; frequency control; micromechanical resonators; Q-factor enhancement; Si; anneal voltage waveform pulsing; batch-compatible post-fabrication annealing technique; frequency trimming; localized filament annealing; micromechanical resonators; resonance frequencies; surface-micromachined polysilicon mechanical resonators; Annealing; Fabrication; Heating; History; Micromechanical devices; Microstructure; Q factor; Resonance; Resonant frequency; Voltage;
Conference_Titel :
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-3829-4
DOI :
10.1109/SENSOR.1997.613594