DocumentCode
314100
Title
Frequency trimming and Q-factor enhancement of micromechanical resonators via localized filament annealing
Author
Wang, Kun ; Wong, Ark-Chew ; Hsu, Wan-Thai ; Nguyen, Clark T -C
Author_Institution
Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI, USA
Volume
1
fYear
1997
fDate
16-19 Jun 1997
Firstpage
109
Abstract
A batch-compatible, post-fabrication annealing technique based upon filament-like heating of microstructures is demonstrated as an effective means for trimming the resonance frequencies (f0´s) and increasing the quality factors (Q´s) of surface-micromachined, polysilicon, mechanical resonators. Although the technique is straightforward, involving the mere application of a suitable voltage between the anchors of a micromechanical resonator, it provides a substantial range of adjustment, with frequency trims of over 2.7% and Q increases of up to 600%, depending upon resonator fabrication history. By pulsing the anneal voltage waveforms, controlled frequency trims of less than 16 ppm per trial are achievable
Keywords
Q-factor; annealing; frequency control; micromechanical resonators; Q-factor enhancement; Si; anneal voltage waveform pulsing; batch-compatible post-fabrication annealing technique; frequency trimming; localized filament annealing; micromechanical resonators; resonance frequencies; surface-micromachined polysilicon mechanical resonators; Annealing; Fabrication; Heating; History; Micromechanical devices; Microstructure; Q factor; Resonance; Resonant frequency; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location
Chicago, IL
Print_ISBN
0-7803-3829-4
Type
conf
DOI
10.1109/SENSOR.1997.613594
Filename
613594
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