• DocumentCode
    314100
  • Title

    Frequency trimming and Q-factor enhancement of micromechanical resonators via localized filament annealing

  • Author

    Wang, Kun ; Wong, Ark-Chew ; Hsu, Wan-Thai ; Nguyen, Clark T -C

  • Author_Institution
    Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI, USA
  • Volume
    1
  • fYear
    1997
  • fDate
    16-19 Jun 1997
  • Firstpage
    109
  • Abstract
    A batch-compatible, post-fabrication annealing technique based upon filament-like heating of microstructures is demonstrated as an effective means for trimming the resonance frequencies (f0´s) and increasing the quality factors (Q´s) of surface-micromachined, polysilicon, mechanical resonators. Although the technique is straightforward, involving the mere application of a suitable voltage between the anchors of a micromechanical resonator, it provides a substantial range of adjustment, with frequency trims of over 2.7% and Q increases of up to 600%, depending upon resonator fabrication history. By pulsing the anneal voltage waveforms, controlled frequency trims of less than 16 ppm per trial are achievable
  • Keywords
    Q-factor; annealing; frequency control; micromechanical resonators; Q-factor enhancement; Si; anneal voltage waveform pulsing; batch-compatible post-fabrication annealing technique; frequency trimming; localized filament annealing; micromechanical resonators; resonance frequencies; surface-micromachined polysilicon mechanical resonators; Annealing; Fabrication; Heating; History; Micromechanical devices; Microstructure; Q factor; Resonance; Resonant frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    0-7803-3829-4
  • Type

    conf

  • DOI
    10.1109/SENSOR.1997.613594
  • Filename
    613594