DocumentCode :
314123
Title :
Measuring and modeling electrostatic adhesion in micromachines
Author :
de Boer, M.P. ; Tabbara, M.R. ; Dugger, M.T. ; Clews, P.J. ; Michalske, T.A.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Volume :
1
fYear :
1997
fDate :
16-19 Jun 1997
Firstpage :
229
Abstract :
We measure deformations of electrostatically actuated cantilever beams adhered to a substrate and compare results to numerical simulations. Beams are peroxide treated and either supercritically dried or coated with octadecyltrichlorosilane (ODTS). In air with relative humidity (RH) of about 50%, measured deformations are consistent with numerical results when an effective insulator thickness of 14 nm is assumed. This value is a measure of the roughness of the substrate. Deformations are generally reversible for voltages up to 2 V. With RH of 75%, deformations of supercritically dried beams are dominated by capillary rather than electrostatic forces. The ODTS-coated beams exhibit less effect from the capillary forces, as expected for a hydrophobic coating
Keywords :
adhesion; electrostatic devices; elemental semiconductors; light interferometry; microactuators; micromechanical resonators; silicon; Michelson interferometer; Si; cantilever beams; capillary forces; deformations; effective insulator thickness; electrostatic actuation; electrostatic adhesion; hydrophobic coating; micromachines; modeling; numerical simulations; octadecyltrichlorosilane coating; peroxide treatment; polysilicon beams; stiction; substrate roughness; supercritical drying; Actuators; Adhesives; Coatings; Electrostatic measurements; Force measurement; Humidity measurement; Insulation; Optical interferometry; Structural beams; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-3829-4
Type :
conf
DOI :
10.1109/SENSOR.1997.613625
Filename :
613625
Link To Document :
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