Title :
Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction
Author :
Matsumoto, Yoshinori ; Yoshida, Kazumasa ; Ishida, Makoto
Author_Institution :
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
Abstract :
Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability towards alkali or acid, the FC film was used for circuit area protection of an integrated accelerometer during silicon alkaline etching process by 25wt% TMAH at 90°C. Moreover, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7 F16,C8F18, etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices
Keywords :
accelerometers; etching; micromachining; microsensors; organic compounds; polymer films; polymerisation; protective coatings; thermal stability; 90 C; CYTOP; Si; TMAH; alkaline etchant protection; capacitive coupling type plasma polymerization; circuit area protection; cyclized perfluoro polymer; deposition rate; deposition techniques; durability; field-free zone; fluorocarbon films; in-use stiction; integrated accelerometer; perfluorinated liquid; spin coating; stiction elimination; surface micromachining devices; thermal stability; Accelerometers; Commercialization; Coupling circuits; Etching; Plasma applications; Plasma stability; Polymer films; Protection; Semiconductor films; Silicon;
Conference_Titel :
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-3829-4
DOI :
10.1109/SENSOR.1997.613747
