DocumentCode
3143498
Title
An improved fast Id -Vg measurement technology with expanded application range
Author
Wang, C. ; Yu, L.C. ; Campbell, J.P. ; Cheung, K.P. ; Xuan, Y. ; Ye, P.D. ; Suehle, J.S. ; Zhang, D.W.
Author_Institution
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear
2009
fDate
18-22 Oct. 2009
Firstpage
163
Lastpage
165
Abstract
Fast Id-Vg measurements on very high performance devices (very low channel ON-resistance) and larger area devices (therefore large gate capacitance) are subject to serious distortions. Methods to minimize these distortions are introduced in this paper; thus expanding the applicable range of this important measurement technique.
Keywords
capacitance; characteristics measurement; distortion; electric current measurement; semiconductor device measurement; semiconductor device reliability; voltage measurement; Id-Vg measurement; device reliability; distortion minimization; gate capacitance; high performance devices; larger area devices; semiconductor device measurement; very low channel ON-resistance; Area measurement; Capacitance measurement; Distortion measurement; Measurement techniques;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-3921-8
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2009.5383006
Filename
5383006
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