DocumentCode :
3144074
Title :
Instabilities in oxide semiconductor transparent thin film transistors
Author :
Conley, J.F., Jr.
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Oregon State Univ., Corvallis, OR, USA
fYear :
2009
fDate :
18-22 Oct. 2009
Firstpage :
50
Lastpage :
55
Abstract :
New amorphous oxide semiconductor transparent thin film transistors (TTFTs) exhibit good mobility (5 to >50 cm2/V-sec), are transparent, and can be processed at low temperatures. They show great promise for high performance large area electronics applications such as flexible electronics, transparent electronics, and analog current drivers for OLED displays. An overview of TFT operation, expected reliability concerns, and an up to date review of recently emerging work on the stability of these devices will be presented.
Keywords :
amorphous semiconductors; flexible electronics; reviews; semiconductor device reliability; semiconductor thin films; thin film transistors; transparency; OLED displays; TTFT device stability; amorphous oxide semiconductor transparent thin film transistor; analog current drivers; flexible electronics; large area electronics; mobility; reliability; review; transparent electronics; Active matrix liquid crystal displays; Amorphous materials; Bonding; Crystalline materials; Crystallization; Flat panel displays; Grain boundaries; Semiconductor materials; Stability; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
Conference_Location :
S. Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4244-3921-8
Electronic_ISBN :
1930-8841
Type :
conf
DOI :
10.1109/IRWS.2009.5383033
Filename :
5383033
Link To Document :
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