DocumentCode
3146029
Title
Crystal adjustment by laser chemical deposition
Author
Williamson, R.J.
Author_Institution
STC Technol. Ltd., Harlow, UK
fYear
1989
fDate
31 May-2 Jun 1989
Firstpage
627
Lastpage
633
Abstract
Maskless adjustment of quartz crystals has been developed using laser-induced deposition of material. The process uses an excimer laser operating in the UV, which dissociates volatile precursors and leaves a stable material. This material is deposited where the laser strikes the surface of the crystal and hence can be used to adjust it. A simple means of beam steering has been developed and the necessary process parameters such as laser fluence and precursor flow rate have been investigated. Problems such as window fouling and gas phase reactions have been solved. Up to 2000 p.p.m. of adjustment to crystal resonators of up to 125-MHz fundamental has been demonstrated. Initial aging of canned crystals look very promising
Keywords
chemical vapour deposition; crystal resonators; laser beam applications; quartz; 125 MHz; 2000 p.p.m. of adjustment; SiO2 crystal resonators; beam steering; canned crystals; crystal resonator adjustment; dissociates volatile precursors; excimer laser; frequency trimming; gas phase reactions; initial ageing; laser chemical deposition; laser fluence; laser-induced deposition of material; maskless adjustment; precursor flow rate; process parameters; quartz crystals; window fouling; Chemical lasers; Crystalline materials; Crystals; Electrodes; Frequency; Gas lasers; Laser beams; Laser excitation; Optical materials; Optical resonators;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control, 1989., Proceedings of the 43rd Annual Symposium on
Conference_Location
Denver, CO
Type
conf
DOI
10.1109/FREQ.1989.68925
Filename
68925
Link To Document