DocumentCode :
3146726
Title :
Microscopic and statistical approach to SILC characteristics-exponential relation between distributed Fowler Nordheim coefficients and its physical interpretation
Author :
Tsuji, N. ; Sakakibara, K. ; Ajika, N. ; Miyoshi, H.
Author_Institution :
ULSI Lab., Mitsubishi Electr. Corp., Hyogo, Japan
fYear :
1998
fDate :
9-11 June 1998
Firstpage :
196
Lastpage :
197
Abstract :
Microscopic characteristics of stress-induced leakage current (mSILC) are studied by analyzing a large amount of data on the charge retention characteristic of stacked gate arrayed transistors. It is found that the SILC characteristics fluctuate in the microscopic regions, but they all fit the Fowler Nordheim (F-N) formula. Moreover, the coefficients /spl alpha/ and /spl beta/ of the F-N equation, which are conventionally constants, are obtained in this study by statistically analyzing mSILC characteristics, and are therefore distributed, with a strong exponential relation to each other. It is found that this correlation can be qualitatively explained by the analytical trap-trap transition model.
Keywords :
MOSFET; electron traps; leakage currents; semiconductor device models; SILC characteristics; analytical trap-trap transition model; charge retention characteristic; distributed Fowler Nordheim coefficients; exponential relation; stacked gate arrayed transistors; stress-induced leakage current; Analytical models; Capacitors; Electron traps; Equations; Laboratories; Leakage current; Microscopy; Stress; Tunneling; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1998. Digest of Technical Papers. 1998 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-4770-6
Type :
conf
DOI :
10.1109/VLSIT.1998.689254
Filename :
689254
Link To Document :
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