• DocumentCode
    3146937
  • Title

    Nano-gap fabrication by focused ion beam for DNA trapping

  • Author

    Kumemura, Momoko ; Tamura, Keiichi ; Hashiguchi, Gen ; Collard, Doifique ; Fujita, Hiroyuki

  • Author_Institution
    Inst. of Ind. Sci., Tokyo Univ.
  • fYear
    2006
  • fDate
    9-12 May 2006
  • Firstpage
    271
  • Lastpage
    272
  • Abstract
    Micromachined tweezers is having nanometer sized gap was fabricated with a silicon etching method and a focussed ion beam technique. The gap of tweezer fabricated by this process was accomplished to be 15 nm-2 mum ranges. The validity of this tweezers was demonstrated by trapping DNA molecules. Trapping of bundle of lambda-DNA molecules between 100 mum gap was succeeded
  • Keywords
    DNA; biological techniques; focused ion beam technology; genetics; micromachining; molecular biophysics; nanotechnology; silicon; sputter etching; focused ion beam technique; lambda-DNA molecule trapping; micromachined tweezer; nanometer sized gap fabrication; silicon etching method; Conducting materials; DNA; Electron traps; Fabrication; Ion beams; Micromachining; Nanobioscience; Probes; Scanning electron microscopy; Silicon; Focusedion beam; Micromahineing; Molecular manipulation; Nano-gap; ¿-DNA;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microtechnologies in Medicine and Biology, 2006 International Conference on
  • Conference_Location
    Okinawa
  • Print_ISBN
    1-4244-0338-3
  • Electronic_ISBN
    1-4244-0338-3
  • Type

    conf

  • DOI
    10.1109/MMB.2006.251547
  • Filename
    4281365
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3146937